Patent AT-E401430-T1: [Translated] DIAMOND COATINGS ON REACTOR WALLS AND METHOD FOR THEIR PRODUCTION
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Updated Oct 29, 2026
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A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a diamond containing surface and process for manufacture thereof.
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Access the complete Patent AT-E401430-T1: [Translated] DIAMOND COATINGS ON REACTOR WALLS AND METHOD FOR THEIR PRODUCTION on the official website.
Modified Apr 29, 2026